850 nm BrightLine 多光子 LaserMUX 合束/分束镜
- 多光子激光合束/分束， 边缘波长 850 nm
- 反射率Ravg > 95%， 670 – 815 nm
- 透过率Tavg > 93%， 890 – 2100 nm
- < 1/10 wave P-V 透射波前差
- < ± 100 fs² 群延迟色散，常见飞秒激光波长
- 平面度Flatness / 反射波前差RWE:Super-resolution / TIRF级别
FF850-Di01-t1-25×36
Description
850 nm BrightLine 多光子 LaserMUX 合束/分束镜
滤光片型号：FF850-Di01-t1-25×36
Theoretical Spectrum for Part Number:FF850-Di01-t1-25×36
FF850-Di01-t1-25×36合束/分束镜透过率曲线，Semrock
850 nm BrightLine 多光子 LaserMUX 合束/分束镜，25.2 mm x 35.6 mm，厚度1.1 mm
多光子 LaserMUX 光束合束/分束镜可在多色和多模态荧光显微镜中实现更深的组织成像和更好的对比度。这些滤光片通过同时实现高透过、高反射和反射与透射的低 GDD，同时保持较小的波前畸变，从而设定了新的性能标准。它们是组合两个飞秒脉冲激光光束的理想选择，非常适合光遗传学和其他生命科学应用。
组合两个或更多飞秒脉冲激光器，如 Ti:Sapphire（和 OPO 耦合）、掺钕和掺镱光纤和玻璃激光器以及铬橄榄石激光器。
组合两个或更多飞秒脉冲激光器，如 Ti:Sapphire（和 OPO 耦合）、掺钕和掺镱光纤和玻璃激光器以及铬橄榄石激光器。
滤光片参数：
| Optical Specifications | Value |
|---|---|
| Transmission Band 1 | Tavg > 93% 890 – 2100 nm over any 10 nm window |
| Transmission Band 1 (p-pol) | Tavg > 95% 845 – 2100 nm |
| Transmission Band 1 (s-pol) | Tavg > 90% 890 – 2100 nm |
| Reflection Band 1 | Ravg > 95% 670 – 815 nm over any 10 nm window |
| Reflection Band 1 (p-pol) | Ravg > 90% 670 – 815 nm |
| Reflection Band 1 (s-pol) | Ravg > 98% 670 – 849 nm |
| Edge Wavelength 1 | 850 nm |
| General Filter Specifications | Value |
| Angle of Incidence | 45 ± 1.5 degrees |
| Cone Half-angle | 2 degrees |
| Optical Damage Rating | 50 mJ/cm² @ 800 nm (50 fs pulse width); test pending; specification based on FS01 Mirror test results |
| Transmitted Wavefront Error | λ/10 PV over CA @ 632.8 nm |
| Reflected Wavefront Error | < 1λ P-V RWE @ 632.8 nm |
| Steepness | Standard |
| Flatness / RWE Classification | Super-resolution / TIRF |
| Group Delay Dispersion Transmission (s-pol) 2 | ± 500 fs² over 913 – 2100 nm (excluding substrate, by design) |
| Group Delay Dispersion Reflection (p-pol) 2 | ± 500 fs² over 683 – 812 nm |
| Group Delay Dispersion Transmission (s-pol) 1 | ± 100 fs² over 965 – 2050 nm (excluding substrate, by design) |
| Group Delay Dispersion Reflection (s-pol) 1 | ± 100 fs² over 670 – 828 nm |
| Group Delay Dispersion Transmission (p-pol) 1 | ± 100 fs² over 917 – 2050 nm (excluding substrate, by design) |
| Group Delay Dispersion Reflection (s-pol) 2 | ± 500 fs² over 670 – 840 nm |
| Group Delay Dispersion Transmission (p-pol) 2 | ± 500 fs² over 873 – 2100 nm (excluding substrate, by design) |
| Group Delay Dispersion Reflection (p-pol) 1 | ± 100 fs² over 691 – 795 nm |
| Physical Filter Specifications | Value |
| Transverse Dimensions (L x W) | 25.2 mm x 35.6 mm |
| Transverse Tolerance | ± 0.1 mm |
| Clear Aperture | ≥ 85% (elliptical) |
| Scratch-Dig | 60-40 |
| Substrate Type | Fused Silica |
| Filter Thickness (unmounted) | 1.05 mm |
| Filter Thickness Tolerance (unmounted) | ± 0.05 mm |
| Substrate Thickness Tolerance (1 mm, unmounted) | ± 0.05 mm |
| Orientation | Reflective surface marked with laser dot – Orient in direction of incoming light |
Additional information
| 波长筛选 |
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